Atomic Layer Deposition (ALD) Market Research Report Information by Type

Atomic layer deposition (ALD) can be understood as a technique that helps build a thin film monolayer with a self-limiting reaction. ALD offers a high and reliable degree of thickness resolution, alongside excellent conformity for high aspect ratio surfaces, with a pinhole-free layer, as well. This deposition technique offers controlled functioning over large areas that have extreme precision and repeatability.

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